ACS Publications Honors ALD Pioneer Professor Markku Leskelä

ACS Publications is celebrating Professor Markku Leskelä of the University of Helsinki for his decades-long career and pioneering contributions in Atomic Layer Deposition (ALD). He has served as the Director of the Finnish Centre of Excellence in Atomic Layer Deposition, received the American Vacuum Society ALD innovation award (2012), and is widely known as one of the most productive ALD researchers in the history of the field.

To honor Professor Leskelä, we have organized a cross-journal virtual issue featuring papers authored by Professor Leskelä and his coworkers that focuses on his ALD research, as well as a small selection of papers on luminescent materials and organometallic catalysts. The virtual issue also highlights articles from researchers active in ALD chemistry whose work has been influenced by Professor Leskelä’s contributions.

Seán T. Barry, Mikko Ritala, Han-Bo-Raam Lee, and Jillian Buriak served as guest editors for this Virtual Issue. The issue not only collects research Professor Leskelä published in ACS Publications journals but also papers by invited authors who feel their research was influenced by his work. The issue features papers from journals such as Chemistry of Materials, Inorganic Chemistry, The Journal of Physical Chemistry C, Langmuir, and the Journal of the American Chemical Society (JACS).

ACS Publications thanks Professor Leskalä for all of his contributions to ALD and chemistry as a whole. If Professor Leskelä’s work has influenced your research, leave a comment below and share your story.

Read the Virtual Issue Honoring Professor Markku Leskelä

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