This Virtual Special Issue aims to provide a platform for the scientific community to present their high-quality research in patterning technology. Submit your manuscript by April 1, 2024.
Patterning is an essential process to fabricate various devices and structures, such as sensors, electronic devices, and energy devices, with high volume manufacturing capability. Since the technological evolution of many devices is going forward to reduce their size for better performance, larger capacity, and higher portability, various patterning technologies have been developed for maintaining downscaling with precise control of the production quality. For instance, in the nanofabrication of modern Si devices, the current patterning technology is producing precisely controlled electronic devices with a minimum feature size of 3 nm. Because the various patterning technologies are closely related with their relevant industries, they have become one of the most attractive topics for researchers in recent years.
This Virtual Special Issue from Chemistry of Materials aims to provide a platform for the scientific community to present their high-quality research in patterning technology. Relevant topics on patterning technology will be considered, including various initial ideas for precise patterning, improvement of patterning quality by changing materials/processes based on materials chemistry, and theoretical interpretation.
We invite Articles, Perspectives, Reviews, or Methods & Protocols on all topics related to Precision Patterning, including (but not limited to):
- Photolithography by various light source (EUV, e-beam) with relevant materials/processes
- Double/quadruple patterning, thin-film-thickness-determined patterning.
- Self-assembly techniques including block copolymers.
- Selective deposition and selective etching based on surface chemistry.
- Interference patterning
- Imprint lithography and direct writing
Professor Han-Bo-Ram Lee, Associate Editor, Chemistry of Materials
Incheon National University, South Korea
Prof. Lee received his Ph.D. from the Department of Materials Science and Engineering at Pohang University of Science and Technology (POSTECH) in South Korea in 2009 and was a postdoctoral scholar in the Department of Chemical Engineering at Stanford University from 2010 to 2013. He joined the Department of Materials Science and Engineering in Incheon National University as an assistant professor in 2013 and was promoted to Full Professor with tenure in 2022. In addition, he worked at SK hynix as a consulting Professor for the development of new Atomic Layer Deposition (ALD) processes from 2021 to 2022.
Prof. Lee has served as an Associate Editor for Chemistry of Materials since 2018. His current research interests and topics are focused on understanding and controlling surface chemistry and reactions, and applying this knowledge to ALD, Area Selective Deposition (ASD), and Atomic Layer Modulation (ALM) with atomic-level theoretical calculations using Density Functional Theory (DFT) and Monte Carlo simulations.
We welcome submissions for this Virtual Special Issue through April 1, 2024. Submissions must comply with our Author Guidelines and will be subject to the usual rigorous peer review to ensure they fit the scope and conform to the high-quality and significance standards of Chemistry of Materials before acceptance.
Papers accepted for publication for this Virtual Special Issue will be first published as they are accepted in a regular issue of the journal with a note indicating that they are part of the Virtual Special Issue. After all submissions have been published, they are then compiled online on a dedicated landing page to form the Virtual Special Issue.
If you have any general questions regarding submission to this Virtual Special Issue, please contact Professor Han-Bo-Ram Lee (firstname.lastname@example.org).
How to Submit
Log in to the ACS Paragon Plus submission site.
- Choose ACS Materials Letters as your journal.
- Select your manuscript type.
Under the "Special Issue Selection" menu, choose "Precision Patterning."